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Semiconductor Process Technology Academy Inc.

Facilities
![]() SPTA | ![]() Air shower | ![]() 방진복 |
---|---|---|
![]() Yellow Room | ![]() OvenSinge | ![]() Spin CoaterPR & SOG Coating |
![]() Hot PlateBake | ![]() Align & Exposer System | ![]() Wet StationDEvelop & Rinse |
![]() DI Water System | ![]() MicroscopeInspection | ![]() 냉장고 |
![]() Photo Mask | ![]() Wet StationDevelop & Rinse | ![]() Dry EtchOxide, Nitride, Si Etch |
![]() RTAAnnealing & Sintering | ![]() PECVD | ![]() LPCVDPoly-Si & SiN Deposition |
![]() FurnaceOxidation | ![]() E-Beam Evaporator | ![]() 4-Point Probe저항 측정 |
![]() Ellipsometer두께 측정 | ![]() CMP & Cleaner | ![]() PCW |
![]() Gas Cabinet | ![]() 반도체소자 특성측정기 | ![]() 반도체소자 특성측정기 |
![]() Semiconductor Parameter AnalyzerHP4145 전류-전압 특성 측정 | ![]() Multi Frequency LCR MeterHP4284 커패시턴스-전압 특성 측정 | ![]() Probe Station웨이퍼 프로빙 |
![]() Probe Station | ![]() Probe Station | ![]() Probe Station |
![]() Wire Ball BonderPCB 패키징 Kulicke&Soffa - Model 4522 | ![]() Classroom | ![]() Classroom1 |
![]() Classroom2 |
History

24.11 와이어본딩장비

20.6.9 CMP 및 Post cleaner

20.6.5 RTA 밎 Evaporator

20.6.5 Dry Etcher

20.6.5 LPCVD 및 PECVD

20.6.4 마스크 Aligner set-up

20.6.4 Developer 및 DI water generator set-up

20.6.4 Wet Bath set-up

20.6.4 Gas scrubber set-up
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